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溅射离子源(可用于样品表面清洗)

简要描述:溅射离子源(可用于样品表面清洗)溅射清洗 /表面准备,用于表面科学, MBE ,高真空溅射过程
离子辅助沉积
离子束溅射镀膜
反应离子刻蚀

  • 产品型号:
  • 厂商性质:代理商
  • 更新时间:2024-02-27
  • 访  问  量:309

详细介绍

溅射离子源(可用于样品表面清洗)

仪器简介:
典型应用是氩离子溅射清洗表面(中科院物理所配置多套IG2型离子源)
溅射清洗 /表面准备,用于表面科学,  MBE ,高真空溅射过程
离子辅助沉积
离子束溅射镀膜
反应离子刻蚀

溅射离子源(可用于样品表面清洗IG2 2kV Backfill Ion Source and Control

RBD Instruments’ IG2 Ion Source Package is the ideal solution for sputter cleaning of samples under UHV conditions. The IG2 Ion Source Package consists of the Model 04-165 2 kV Backfill Ion Source and the Model 32-165 Ion Source Control. These units are interchangeable with the PHI® 04-161 and 04-162 ion guns and the PHI® 20-045 control, respectively.

High-Performance Ion Guns and Controllers

I40114021407

NTI 1401

NTI 1402

NTI 1407

The Model 1401 Ion Gunis ideal for use in surface chemistry experiments such as sample preparation and depth profiling with Auger and XPS. It can be used with most inert gasses.

The Model1407 Ion Gunfeatures Duoplasmatron performance in an electron impact ionization ion gun. By means of changeable apertures in the optics column, a wide range of beam currents and spot sizes may be obtained. At a beam energy of 5 keV, beam current may be adjusted from 2 uA into a 20 um diameter spot to 20 uA into a 100 um diameter spot.

The Model 1402 Ion Gunfeatures high beam currents at very low beam energies. It also may be operated at high beam energies (up to 3 keV) to provide additional depth profiling and sample cleaning capability

3 kV Ion Source Package

RBD is now providing a 3 kV ion source sputter package that comprises an electron discharge source, power supply, and cable. Designed to operate as low as 100 eV, the 3 kV ion source provides a large 10 mm spot size and is compatible with all inert gasses and does not require differential pumping.

The package includes ion source, electronic control unit, sample current meter, cabling, operating manual and a spare filament assembly.
 

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